污(Wu)垢(Gou)热(Re)阻(Zu)测(Ce)试(Shi)仪(Yi)解(Jie)决(Jue)了(Liao)以(Yi)来(Lai)监(Jian)测(Ce)换(Huan)热(Re)器(Qi)难(Nan)以(Yi)准(Zhun)确(Que)测(Ce)量(Liang)污(Wu)垢(Gou)热(Re)阻(Zu)值(Zhi),(?)准(Zhun)确(Que)测(Ce)量(Liang)污(Wu)垢(Gou)热(Re)阻(Zu)和(He)直(Zhi)接(Jie)观(Guan)察(Cha)污(Wu)垢(Gou)热(Re)阻(Zu)变(Bian)化(Hua)的(De)全(Quan)过(Guo)程(Cheng);(?)采(Cai)用(Yong)单(Dan)片(Pian)机(Ji)作(Zuo)主(Zhu)机(Ji),(?)减(Jian)少(Shao)外(Wai)围(Wei)部(Bu)件(Jian),(?)提(Ti)高(Gao)可(Ke)靠(Kao)性(Xing);(?)可(Ke)对(Dui)多(Duo)项(Xiang)试(Shi)验(Yan)参(Can)数(Shu)设(She)定(Ding),(?)适(Shi)合(He)多(Duo)场(Chang)合(He)的(De)试(Shi)验(Yan)要(Yao)求(Qiu)。(?)
智(Zhi)能(Neng)污(Wu)垢(Gou)热(Re)阻(Zu)测(Ce)试(Shi)仪(Yi)现(Xian)货(Huo) 1.采(Cai)用(Yong)的(De)RISC 32位(Wei)ARM处(Chu)理(Li)器(Qi),比(Bi)8位(Wei)单(Dan)片(Pian)机(Ji)处(Chu)理(Li)速(Su)度(Du)快(Kuai)几(Ji)十(Shi)倍(Bei),从(Cong)而(?)采(Cai)样(Yang)次(Ci)数(Shu)更(Geng)高(Gao),更(Geng)准(Zhun). 2.内(Nei)装(Zhuang)图(Tu)形(Xing)操(Cao)作(Zuo)系(Xi)统(Tong),操(Cao)作(Zuo)人(Ren)性(Xing)化(Hua),便(Bian)于(Yu)学(Xue)习(Xi). 3.采(Cai)用(Yong)蓝(Lan)色(Se)大(Da)屏(Ping)幕(Mu)液(Ye)晶(Jing)((?)240*128)(?),可(Ke)实(Shi)现(Xian)场(Chang)查(Cha)询(Xun)数(Shu)据(Ju),显(Xian)示(Shi)曲(Qu)线(Xian)图(Tu),从(Cong)而(?)可(Ke)预(Yu)测(Ce)污(Wu)垢(Gou)热(Re)阻(Zu)趋(Qu)势(Shi).